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Analytical description of the sputtering yields of silicon bombarded with normally incident ions.

Phys. Rev. B Condens. Matter 68, 235211/1-235211-11 (2003)
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Publication type Article: Journal article
Document type Scientific Article
Language english
Publication Year 2003
HGF-reported in Year 0
ISSN (print) / ISBN 0163-1829
e-ISSN 1095-3795
Quellenangaben Volume: 68, Issue: , Pages: 235211/1-235211-11 Article Number: , Supplement: ,
Publisher American Physical Society (APS)
Reviewing status Peer reviewed
POF-Topic(s) 30504 - Mechanisms of Genetic and Environmental Influences on Health and Disease
Research field(s) Radiation Sciences
PSP Element(s) G-501100-006
Erfassungsdatum 2003-12-31